Common Semiconductor Gases by Lenox Laser - Semiconductor Cleaning and etching chemicals for flow

Listed below are common gases that are used in the Semiconductor Industry. These gases help manufacturers clean and etch surfaces while building chips and other components. Lenox Laser develops precision orifices to help regulate the flows of these gases for each critical system process.

Semiconductor Gases	Symbol	Molecular Weight
Allene	C₃H₄	40.065
Ammonia	NH₃	17.03
Argon	Ar	39.95
Arsenic Trifluoride	AsF₃	131.9
Arsine	AsH₃	77.95
Boron Trichloride	BCl₃	117.2
Bromine	Br	79.904
Carbon Dioxide	CO₂	44
Carbon Monoxide	CO	28
Carbon Tetrafluoride	CF₄	88
Chlorine	Cl₂	70.9
Chlorine Trifluoride	ClF₃	92.4
Diborane	B₂H₆	27.7
Dichlorosilane	SiH₂Cl ₂	101.01
Disilane	Si₂H₆	62.2
Ethylene Oxide	C₂H₄O	44.1
Germane	GeH₄	76.62
Halocarbon 116 (Hexafluoroethane)	C₂F₆	138.01
Halocarbon 125 (Pentafluroethane) – Zyron 125	C₂HF₅	120.03
Halocarbon 134a (Tetrafluoroethane) – Zyron 134a	CH₂FCF₃	102
Halocarbon 14 (Tetrafluoromethane)	CF₄	88.01
Halocarbon 218 (Perfluoropropane)	C₃F₈	188.02
Halocarbon 23 (Trifluoromethane)	CHF₃	70.01
Halocarbon 32 (Difluoromethane) – Zyron 32	CH₂F₂	52.02
Halocarbon 41 (Methyl Fluoride)	CH₃F	34.03
Halocarbon c-318 (Octafluorocyclobutane)	C₄F₈	200.03
Helium	He	4
Hexafluroethane	C₂F₆	138.02
Hydrogen	H₂	2.02
Hydrogen Bromide	HBr	80.9
Hydrogen Chloride	HCl	36.5
Hydrogen Fluoride	HF	20
Hydrogen Sulfide	H₂S	34.1
Methane	CH₄	16
Molybdenum Hexafluoride	MoF₆	209.93
Neon	Ne	20.2
Nitric Oxide	NO	30.006
Nitrogen	N₂	28
Nitrogen Trifluoride	NF₃	71
Nitrous Oxide	N₂O	44
Oxygen	O₂	32
Pentaborane	B₅H₉	63.1
Phosgene	COCl₂	98.9
Phosphine	PH₃	34
Phosphorous Pentafluoride	PF₅	125.96
Phosphourous Trifluoride	PF₃	87.969
Silane	SiH₄	32.1
Silicon Teterafluoride	SiF₄	104.08
Silicon Tetrachloride	SiCl₄	169.9
Stibine	SbH₃	124.774
Sulfur Dioxide	SO₂	64.1
Sulfur Hexafluoride	SF₆	146.1
Trichlorosilane	SiHCl₃	135.5
Tungsten Hexafluoride	WF₆	297.84
Vinyl Bromide	C₂H₃Br	106.95
Vinyl Chloride	C₂H₃Cl	62.5
Vinyl Fluoride	C₂H₃F	46.044
Xenon	Xe	131.3